Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics

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Authors	ELIÁŠ Marek SOUČEK Pavel VAŠINA Petr
Year of publication	2009
Type	Article in Proceedings
Conference	Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	hybrid PVD-PECVD
Description	Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition