Modeling of reactive sputtering process with non-linear discharge current density
| Authors | |
|---|---|
| Year of publication | 2008 |
| Type | Article in Proceedings |
| Conference | Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry |
| MU Faculty or unit | |
| Citation | |
| Field | Plasma physics |
| Keywords | reactive magnetron sputering; target; discharge current density; racetrack |
| Description | Modeling of reactive sputtering process with non-linear discharge current density, proceeding |
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