Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process

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Authors	VAŠINA Petr HYTKOVÁ Tereza ELIÁŠ Marek
Year of publication	2008
Type	Article in Proceedings
Conference	19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts
MU Faculty or unit	Faculty of Science
Citation
Field	Plasma physics
Keywords	reactive magnetron sputering; target
Description	Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process, proceeding, interdisciplinary study of plasma physics
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition