Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process

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Authors	DVOŘÁK Pavel VAŠINA Petr
Year of publication	2008
Type	Article in Proceedings
Conference	19th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - Book of Abstracts
MU Faculty or unit	Faculty of Science
Citation
web	http://www.escampig2008.csic.es/
Field	Plasma physics
Keywords	magnetron; reactive sputtering; plasma; discharge; higher harmonics;
Description	The fundamental and the higher harmonics of the cathode voltage and of the uncompensated probe potential were used as a tool to control the reactive magnetron sputtering. It was shown that this methode is very sensitive and is suitable for the control of the deposition process.
Related projects:	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface Study of hybrid deposition process and its application for thin film deposition